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For Resist

DIC can offer cresol novolak resins and various novolak resins for resists designed according to your needs.Please feel free to contact us for more details.

Product Characteristics

Product Characteristics

  • High Heat Resistance(Tg)& High Sensitivity
  • Metal ion control at the ppb level
  • Advanced molecular weight/molecular weight distribution control

Due to our original molecular design and synthesis technology, we control molecular weight/ molecular weight distribution depending on the application.

Applications

  • Photoresist polymer for Semiconductor & Display
  • Multi-layer process materials(anti-reflective coating, flattened film), Insulation film
  • Printing materials PS plate resist

Product Lineup

Product name Type Nonvolatile
(%)
Solids Tg
(℃)
ADR
(Å/s)
Mw Type of Solvent Characteristic
PR-30-40P Modified m/p cresol novolak 40 51-57 >9000 1500-2000 PGMEA
(Ethyl lactate,
Cyclohexanone,etc)
Ultra-high sensitivity
PR-100L-50P Functional cresol novolak
(Tandem type)
50 119-124 590 1500-2000 High heat resistance
High resolution
High sensitivity
PR-100-50P 130-135 310 7800-8300
PR-100H-50P 143-148 100 15300-15800
PR-50 m/p cresol novolak 40 92-98 900-1200 3000-6000 High resolution
PR-55 101-107 150-250 12000-15000
PR-56-1 90-96 100-110 13000-16000
PR-56-2 94-102 70-80 14000-17000
WR-101 Phenol novolak 37-42 8200 900-1100 High sensitivity
WR-102 38-53 7900 1400-1600
WR-103 59-64 6200 2000-2300
WR-104 77-82 3700 6600-7100

Products in small amount prototype stage are included. Please contact us for the details.

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